JPH0510423B2 - - Google Patents

Info

Publication number
JPH0510423B2
JPH0510423B2 JP61102152A JP10215286A JPH0510423B2 JP H0510423 B2 JPH0510423 B2 JP H0510423B2 JP 61102152 A JP61102152 A JP 61102152A JP 10215286 A JP10215286 A JP 10215286A JP H0510423 B2 JPH0510423 B2 JP H0510423B2
Authority
JP
Japan
Prior art keywords
crucible
reactive gas
substrate
nozzle
vacuum chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61102152A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62260053A (ja
Inventor
Shigeru Yamaji
Hiromoto Ito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP10215286A priority Critical patent/JPS62260053A/ja
Publication of JPS62260053A publication Critical patent/JPS62260053A/ja
Publication of JPH0510423B2 publication Critical patent/JPH0510423B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
JP10215286A 1986-05-06 1986-05-06 化合物薄膜蒸着装置 Granted JPS62260053A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10215286A JPS62260053A (ja) 1986-05-06 1986-05-06 化合物薄膜蒸着装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10215286A JPS62260053A (ja) 1986-05-06 1986-05-06 化合物薄膜蒸着装置

Publications (2)

Publication Number Publication Date
JPS62260053A JPS62260053A (ja) 1987-11-12
JPH0510423B2 true JPH0510423B2 (en]) 1993-02-09

Family

ID=14319760

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10215286A Granted JPS62260053A (ja) 1986-05-06 1986-05-06 化合物薄膜蒸着装置

Country Status (1)

Country Link
JP (1) JPS62260053A (en])

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5529634A (en) * 1992-12-28 1996-06-25 Kabushiki Kaisha Toshiba Apparatus and method of manufacturing semiconductor device
US5582879A (en) * 1993-11-08 1996-12-10 Canon Kabushiki Kaisha Cluster beam deposition method for manufacturing thin film

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5176182A (ja) * 1974-12-27 1976-07-01 Matsushita Electric Ind Co Ltd Butsushitsuhakumakuseiseisochi

Also Published As

Publication number Publication date
JPS62260053A (ja) 1987-11-12

Similar Documents

Publication Publication Date Title
JPH0510423B2 (en])
JPS60262963A (ja) 化合物薄膜蒸着装置
JPH0510424B2 (en])
JPS6329925A (ja) 化合物薄膜形成装置
JPS62287617A (ja) 薄膜形成装置
JPH05339720A (ja) 薄膜形成装置
JPH0535218B2 (en])
JPH0215630B2 (en])
JPS60125368A (ja) 薄膜蒸着装置
JPS60244018A (ja) クラスタイオンビ−ム蒸着装置
JPS60124931A (ja) 薄膜蒸着装置
JPH0541698B2 (en])
JPH0483868A (ja) 薄膜形成装置
JPH0719746B2 (ja) 薄膜蒸着装置
JPS6215815A (ja) 薄膜蒸着装置
JPH0774435B2 (ja) 薄膜形成装置
JPS60158618A (ja) 薄膜蒸着装置
JPS60124933A (ja) 薄膜蒸着装置
JPH05311407A (ja) 薄膜形成装置
JPS6274070A (ja) 薄膜蒸着装置
JPS63133518A (ja) 蒸着装置
JPS63216967A (ja) 薄膜形成装置
JPS60124915A (ja) 薄膜蒸着装置
JPS63230868A (ja) 化合物薄膜形成方法
JPH03158460A (ja) 薄膜形成装置